Plasma processing apparatus, plasma control method, and computer storage medium

A plasma control method comprising:

• acquiring state information indicating a measured state of a target object as a plasma processing target;
• and
• controlling plasma processing based on the state of the target object indicated by the acquired state information such that a difference between a height of a plasma sheath above the target object mounted on a mounting table and a height of an interface of a plasma sheath above a focus ring that surrounds the target object is within a predetermined range.

A computer-readable storage medium including computer executable instructions, wherein the instructions, when executed by a processor, cause the processor to perform a plasma control method including:

• acquiring state information indicating a measured state of a target object as a plasma processing target;
• and
• controlling plasma processing based on the state of the target object indicated by the acquired state information such that a difference between a height of an interface of a plasma sheath above the target object mounted on a mounting table and a height of an interface of a plasma sheath above a focus ring is within a predetermined range.