Plasma generating method

A plasma generating method comprising:

• providing a plasma processing apparatus including a chamber;
• a radio-frequency power supply;
• an electrode electrically connected to the radio-frequency power supply to generate plasma within the chamber;
• and a matching device provided between the radio-frequency power supply and the electrode in order to match a load side impedance of the radio-frequency power supply with an output impedance of the radio-frequency power supply, the matching device including a plurality of first series circuits connected in parallel to each other and each including a capacitor and a switching element connected to the capacitor in series, and a plurality of second series circuits connected in parallel to each other and each including a capacitor and a switching element connected to the capacitor in series;
• supplying radio-frequency power to the electrode via the matching device from the radio-frequency power supply in order to generate plasma within the chamber;
• determining whether or not plasma is generated within the chamber from one or more parameters reflecting plasma generation within the chamber during the supplying the radio-frequency power;
• matching the load side impedance with the output impedance of the radio-frequency power by the matching device;
• and
• when it is determined that plasma is not generated within the chamber in the determining, adjusting a frequency of the radio-frequency power output from the radio-frequency power supply so as to set the load side reactance of the radio-frequency power supply to zero or to bring the load side reactance close to zero.