Metrology Method and Apparatus, Computer Program and Lithographic System
AssigneeASML Netherlands B.V.
InventorsSu-Ting CHENG, Sergei Sokolov, Armand Eugene Albert Koolen
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Abstract
Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
Claims21
-15. (canceled)
A method of mitigating for a process dependent stray light artifact on a measurement of a structure, the method comprising:
- obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement.
A non-transitory computer program product comprising machine-readable instructions for causing a processor to cause performance of an operation for mitigating for a process dependent stray light artifact on a measurement of a structure, the operations comprising:
- obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement.
Dependencies are inferred from the claim text.