A method for optimization of a lithographic process

A method for improving the yield of a lithographic process, the method comprising:

• obtaining performance parameter data associated with at least part of a substrate, wherein the performance parameter data is utilized to control the lithographic process;
• determining a process window fingerprint of the performance parameter across the at least part of the substrate, the process window being associated with an allowable range of the performance parameter;
• and
• modifying at least some of the performance parameter data based on a predicted effect of the modifying on the yield of the lithographic process.

A method for improving the yield of a lithographic process, the method comprising:

• determining an uncertainty fingerprint of a performance parameter across a substrate;
• determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter;
• determining, using the uncertainty fingerprint and the process window fingerprint, a probability metric associated with a probability of the performance parameter being outside an allowable range;
• and
• determining a position of a metrology target on the substrate or a measurement position of a metrology target on the substrate, based on the probability metric.