Substrate treating composition and method for fabricating a semiconductor device using the same

A method for fabricating a semiconductor device, the method comprising:

• applying a composition comprising a first monomer and a second monomer on a substrate;
• performing a baking process to form a monolayer on the substrate;
• and
• forming a photoresist pattern on the monolayer,
• wherein the first monomer is represented by Formula 1:
• X—Si(R1)2(R2) [Formula 1]
• wherein each of R1 and R2 is an alkyl group of 1 to 20 carbon atoms or an alkoxy group of 1 to 20 carbon atoms, and X is i) a cyclic amine or an organic group comprising the same, or ii) an alkyl group of 1 to 20 carbon atoms, in which at least one hydrogen atom is substituted with an amino group, a phenyl group in which at least one hydrogen atom is substituted with an amino group or a hydroxyl group, an ester bond, or a combination thereof,
• the second monomer is represented by Formula 7:
• Y—Si(R3)3 [Formula 7]
• wherein R3 is an alkoxy group of 1 to 20 carbon atoms, and Y is i) a cyclic amine or an organic group comprising the same, or ii) an alkyl group of 1 to 20 carbon atoms, in which at least one hydrogen atom is substituted with an amino group, a sulfide bond, an ether bond, an alkyl group of 1 to 20 carbon atoms, which is bonded to a sulfonyl group, or a combination thereof, and
• the monolayer comprises a dehydration-condensation product of the first monomer and the second monomer.

A method for fabricating a semiconductor device, the method comprising:

• applying a composition comprising a first monomer and a second monomer on a substrate;
• and
• performing a baking process to form a monolayer on the substrate, wherein the monolayer is bonded to the substrate by a Si—O bond,
• wherein the first monomer is represented by Formula 1:
• X—Si(R1)2(R2) [Formula 1]
• wherein each of R1 and R2 is an alkyl group of 1 to 20 carbon atoms or an alkoxy group of 1 to 20 carbon atoms, and X is i) a cyclic amine or an organic group comprising the same, or ii) an alkyl group of 1 to 20 carbon atoms, in which at least one hydrogen atom is substituted with an amino group, a phenyl group in which at least one hydrogen atom is substituted with an amino group or a hydroxyl group, an ester bond, or a combination thereof,
• the second monomer is represented by Formula 7:
• Y—Si(R3)3 [Formula 7]
• wherein R3 is an alkoxy group of 1 to 20 carbon atoms, and Y is i) a cyclic amine or an organic group comprising the same, or ii) an alkyl group of 1 to 20 carbon atoms, in which at least one hydrogen atom is substituted with an amino group, a sulfide bond, an ether bond, an alkyl group of 1 to 20 carbon atoms, which is bonded to a sulfonyl group, or a combination thereof.