Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I):

• wherein, in formula (I),
• R1, R2, R3 and R4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms,
• R5, R6 and R7 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—,
• m5 represents an integer of 0 to 3, and when m5 is 2 or more, a plurality of R6 may be the same or different,
• m6 represents an integer of 0 to 3, and when m6 is 2 or more, a plurality of R7 may be the same or different,
• m7 represents an integer of 0 to 3, and when m7 is 2 or more, a plurality of R8 may be the same or different,
• R8 and R9 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, and
• AI− represents an organic anion.