Infrared Cut-off Filter and Preparation Method Thereof
AssigneeXinyang Sunny Optics Co., Ltd.
InventorsLei Wang, Weihong Ding, Rui Du
Life of this patent
Estimating the term…
Abstract
The application relates to an infrared cut-off filter, which includes: a substrate composed of white glass and an infrared cut-off film layer plated on one surface of the white glass; a spin-coated layer plated on the other surface of the white glass; and a reflection-reducing film layer plated on the spin-coated layer; the spin-coated layer includes a bottom layer and an absorbing layer each composed of an organic substance. The infrared cut-off filter has a stable structure, a high degree of firmness between layers, and a low cost.
Claims16
An infrared cut-off filter, comprising:
- a substrate composed of white glass and an infrared cut-off film layer plated on one surface of the white glass;
- a spin-coated layer plated on the other surface of the white glass;
- and a reflection-reducing film layer plated on the spin-coated layer;
- wherein the spin-coated layer comprises a bottom layer and an absorbing layer each composed of an organic substance.
A method for preparing an infrared cut-off filter, comprising the steps of:
- (a) using an ultrasonic cleaning process to clean white glass;
- (b) plating an infrared cut-off film layer on one surface of the white glass;
- (c) cleaning the substrate using a plasma cleaning process;
- (d) cleaning the substrate using an ultrasonic cleaning process;
- (e) plating a spin-coated layer on a surface of the substrate which is not plated with the infrared cut-off film layer;
- and
- (f) evaporate plating a reflection-reducing film layer on the spin-coated layer.
Dependencies are inferred from the claim text.