X-ray Analysis Apparatus and Method

An X-ray analysis apparatus (2), comprising:

• an X-ray source (4) for generating X-rays;
• a sample stage (8) configured to support a sample (6), the X-ray source and the sample stage being arranged so that X-rays generated by the X-ray source define an incident X-ray beam (12) that irradiates the sample, wherein the incident X-ray beam is directed from the X-ray source to the sample along an incident X-ray beam path;
• a first beam mask component (22) arranged between the X-ray source (4) and the sample (6), in the incident X-ray beam path, wherein the first beam mask component (22) comprises a body (220), a first opening (222) for limiting the size and/or divergence of the incident X-ray beam and a second opening (224);
• wherein the first beam mask component (22) has a first configuration and a second configuration, wherein in the first configuration:
• the first opening (222) is arranged in the incident X-ray beam path so as to limit the size and/or divergence of the incident X-ray beam and the second opening (224) is arranged outside of the incident X-ray beam path, and
• in the second configuration:
• the second opening (224) is arranged in the incident X-ray beam path, and the body (220) and the first opening (222) are arranged outside of the incident X-ray beam path;
• and
• the X-ray analysis apparatus further comprises a controller (17) configured to control a first beam mask component actuator (225) to change the configuration of the first beam mask component (22) between the first configuration and the second configuration by moving the first beam mask component (22) in a plane intersected by the incident X-ray beam.