Substrate treatment apparatus and substrate treatment method

Abstract

The present disclosure relates to a substrate treatment apparatus and a substrate treatment method, and more particularly, to a substrate treatment apparatus and a substrate treatment method configured to deposit a uniform thin film on a substrate. A substrate treatment apparatus, in accordance with an exemplary embodiment, includes a reaction tube having an internal space formed therein, a substrate boat configured to load a plurality of substrates in multi-stages, and positioned in the internal space to partition a plurality of treatment spaces in which the plurality of substrates are respectively treated, a process gas supply part configured to supply a process gas to the plurality of treatment spaces, and a dilution gas supply part configured to supply a dilution gas for diluting the process gas within the plurality of treatment spaces.

Dependencies are inferred from the claim text.