Cleaning liquid supply device, cleaning unit, and storage medium storing program

A device for supplying a cleaning device with chemical liquid for cleaning, the device comprising:

• a chemical liquid inlet portion and a dilution water inlet portion;
• a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion;
• and
• a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, wherein
• the first chemical liquid control unit includes:
• a first chemical-liquid-flow-rate control unit configured to receive a supply of chemical liquid from the chemical liquid inlet portion to control a flow rate of the chemical liquid;
• a first dilution-water-flow-rate control unit configured to receive a supply of a dilution water from the dilution water inlet portion to control a flow rate of the dilution water;
• and
• a first mixing portion that mixes the chemical liquid and the dilution water from the first chemical-liquid-flow-rate control unit and the first dilution-water-flow-rate control unit, and
• the second chemical liquid control unit includes:
• a second chemical-liquid-flow-rate control unit configured to receive a supply of the chemical liquid from the chemical liquid inlet portion to control a flow rate of the chemical liquid;
• a second dilution-water-flow-rate control unit configured to receive a supply of the dilution water from the dilution water inlet portion to control a flow rate of the dilution water;
• and
• a second mixing portion configured to mix the chemical liquid and the dilution water from the second chemical-liquid-flow-rate control unit and the second dilution-water-flow-rate control unit.