Compositions and methods for inhibiting hair growth

A pharmaceutical composition comprising:

• A) a compound of Formula I, Formula II, or an 11-deoxy-16-fluoro PGF2α analog of Formula II;
• B) a carrier;
• and
• C) at least one activity enhancer selected from the group consisting of:
• i) a hair growth inhibitor selected from the group consisting of eflornithine, advanced glycation end products (AGE's), lysine, extracts of Tetraselmis species, fibroblast growth factor (FGF)18, cytotoxic lectin, trypsin, extract of Juniperus genus, malt extract, extract of ginger root, toxalbumins, inhibitors of cysteine pathway enzymes, inhibitors of nitric oxide synthetase, ornithine amino transferase inhibitors, cyclooxygenase inhibitors, and 5-lipoxygenase inhibitors;
• ii) a hirsutism treatment agent selected from the group consisting of spironolactone, botulinum toxin, cyproterone acetate, flutamide, bicalutamide, inhibitors of 5-alpha reductase, N,N-diethyl-4-methyl-3-oxo-4-aza-5α-androstane-17β-carboxamide, PTHR1 receptor ligands, ketaconazole, estrogen receptor modulators, progesterone, estrogen, RU58841, neuropeptide Y receptor antagonists, thiazolidinedione derivatives, metformin, cyoctol (6-(5-methoxy-1-heptyl)-bicyclo (3,3,0)octan-3-one], extracts of Serenoa repens, Epilobium species, Cucurbita pepo, Urtica dioica, Calluna vulgaris, Populus species, and Barosma species;
• iii) a preventative of chemotherapy-related hair loss or radiation-related hair loss;
• and
• iv) a penetration enhancer;
• wherein R is selected from the group consisting of CO2H, C(O)NHOH, CO2R1, CH2OH, S(O)2R1, C(O)NHR1, P(O)(OR1) R2, C(O)NHS(O)2R1, and tetrazole;
• R1 and R2 are independently selected from the group consisting of a hydrogen atom, monovalent hydrocarbon groups, substituted monovalent hydrocarbon groups, aromatic groups, substituted aromatic groups, carbocyclic groups, substituted carbocyclic groups, heterogeneous groups, substituted heterogeneous groups, heterocyclic groups, substituted heterocyclic groups, heteroaromatic groups, and substituted heteroaromatic groups;
• W is —CH2—, —O—, or —S(O)2—;
• and
• X is halogen, lower alkyl, alkoxy, or hydrogen.