Substrate processing method and substrate processing apparatus

A substrate processing apparatus comprising:

• a substrate holding unit that holds a substrate;
• a rotation unit that rotates a substrate held by the substrate holding unit around a rotational axis passing through a central portion of the substrate;
• a chemical liquid supply unit that supplies a chemical liquid to a substrate held by the substrate holding unit;
• a processing cup that surrounds a periphery of the substrate holding unit and through which a chemical liquid discharged from a substrate held by the substrate holding unit flows, the processing cup having a first flow space and a second flow space separated from the first flow space;
• a flow destination switching unit that switches a flow destination of a chemical liquid discharged from a substrate held by the substrate holding unit between the first flow space and the second flow space;
• and
• a controller that controls the rotation unit, the chemical liquid supply unit, and the flow destination switching unit,
• the controller executing:
• a chemical liquid supply step of supplying a chemical liquid to a main surface of the substrate by means of the chemical liquid supply unit while rotating the substrate around the rotational axis;
• and a flow destination switching step of switching a flow destination of a chemical liquid expelled from the substrate from the first flow space to the second flow space by means of the flow destination switching unit in parallel with the chemical liquid supply step.