Transparent illumination photolithography methods and systems
AssigneeNanoPath, Inc.
InventorKevin Donahue
Life of this patent
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Abstract
A method of forming a one-way see-through illumination device including a light guide and a pattern of pixels on a surface of the light guide. The method includes forming pixel wells corresponding to the pixels, via a formation method including photolithography, on the surface of the light guide. The pixels, including a light diffusing layer and a light reflecting layer, are formed using the pixel wells, wherein the pattern of pixels and the light guide are arranged to generate transparent illumination by the frustration of total internal reflection of light injected into the light guide.
Claims20
A method of forming a one-way see-through illumination device including a light guide and a pattern of pixels on a surface of the light guide, the method comprising:
- forming pixel wells corresponding to the pixels, via a formation method including photolithography, on the surface of the light guide;
- and
- forming the pixels, including a light diffusing layer and a light reflecting layer, using the pixel wells, wherein the pattern of pixels and the light guide are arranged to generate transparent illumination by the frustration of total internal reflection of light injected into the light guide.
A one-way see-through illumination device, comprising
- a light guide;
- a light source at an edge of the light guide, and configured to inject light into the edge of the light guide;
- a pattern of pixels on a surface of the light guide, the pixels including a light diffusing layer and a light reflecting layer, wherein the pattern of pixels and the light guide are arranged to generate transparent illumination by the frustration of total internal reflection of light injected into the light guide,
- wherein the pixels have a width less than 15 microns.
Dependencies are inferred from the claim text.