Resin, resist composition and method for producing resist pattern

A resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group:

• wherein, in formula (I),
• R1 represents a saturated hydrocarbon group having 1 to 24 carbon atoms which may have a substituent or an aromatic hydrocarbon group having 6 to 24 carbon atoms which may have a substituent, and a methylene group included in the saturated hydrocarbon group may be substituted with an oxygen atom or a carbonyl group,
• R2 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom,
• Ar represents an aromatic hydrocarbon group having 6 to 24 carbon atoms which may have a substituent, and
• L1 represents a group represented by any one of formula (X1-1) to formula (X1-8):
• wherein, in formula (X1-5) to formula (X1-8),
• L11, L13, L15 and L17 each independently represent an alkanediyl group having 1 to 6 carbon atoms,
• L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
• * and ** are bonds, and ** represents a bond to an iodine atom.