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US 2019/0291145 A1Published application
Method of cleaning process chamber
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsung-Lin Lee, Yi-Ming Lin, Chih-Hung Yeh, Zi-Yuang Wang
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Abstract
A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.
Claims20
A method of cleaning a process chamber, comprising:
- forming a plurality of process films and a plurality of non-process films alternately on an interior surface of the process chamber;
- and
- performing a cleaning operation to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.
A method of cleaning a process chamber, comprising:
- repeating (a) introducing a first precursor and a second precursor into a process chamber for a first time period and (b) introducing the first precursor into the process chamber for a second time period alternately m times, wherein m is an integer between 1 and 25, and a film stack is built up on an interior surface of the process chamber after step (a) and step (b) are repeated m times;
- and
- performing a cleaning operation to remove the film stack from the interior surface of the process chamber.
A method of cleaning a process chamber, comprising:
- (1) transferring a substrate into a process chamber having an interior surface;
- (2) depositing a process film over the substrate, wherein the process film is also deposited on the interior surface of the process chamber;
- (3) transferring the substrate out of the process chamber;
- (4) depositing a non-process film on the interior surface of the process chamber;
- (5) repeating (1)-(4) m times, where m is an integer between 1 and 25;
- and
- (6) performing a cleaning operation to remove the process films and the non-process films from the interior surface of the process chamber.
4 more elements
Dependencies are inferred from the claim text.