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US 2019/0246503 A1Published application
Electronic Circuit Production
AssigneeDST Innovations Limited
InventorsAnthony Miles, Robert Miles
Life of this patent
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Abstract
Electrolytic Etching/Deposition System. A system for continuous circuit fabrication comprising means for storing and dispensing the substrate, means for laminating the substrate, means for printing the substrate, means for optical inspection of the substrate, means for photolithography of the substrate, means for drying the substrate, means for developing the substrate, means for washing the substrate and means for electroplating the substrate.
Claims14
1-9. (canceled)
A method of electrolytic etching, comprising:
- a. introducing a continuous section of substrate into an electrolyte within a container;
- b. applying a voltage between a first electrode in electrical contact with the electrolyte and a second electrode physically separated from the first electrode and in electrical contact with the substrate and thereby etching the substrate by electrolysis;
- and
- c. at a subsequent time, reversing the polarities of the first electrode in electrical contact with the electrolyte and the second electrode in electrical contact with the substrate and thereby increasing the thickness of the etched layer of the substrate by electrolytic deposition.
1 more element
12-13. (canceled)
Dependencies are inferred from the claim text.