Quantum dot film and applications thereof

A method of forming a film for light emitting devices, the method comprising:

• disposing a quantum dot solution on a barrier layer;
• curing the quantum dot solution to form a quantum dot layer adhered to the barrier layer;
• disposing a protective solution on the quantum dot layer;
• and
• curing the protective solution to form a protective layer adhered to the quantum dot layer, wherein the film comprises a stack of the barrier layer, the quantum dot layer, and the protective layer, and wherein the protective layer inhibits permeation of at least oxygen and moisture into the quantum dot layer, and wherein the inorganic layer comprises a polysilazane-based polymer, a polysiloxane-based polymer, or a combination thereof.