Thin-film transistor array substrate and manufacturing method for the same

A thin-film transistor array substrate, comprising:

• a base substrate;
• a gate electrode formed on the base substrate;
• a first storage electrode formed on the base substrate;
• a gate insulation layer covering gate electrode and the first storage electrode;
• a metal oxide active layer formed on the gate insulation layer, and the metal oxide active layer is disposed corresponding to the metal oxide active layer;
• an etching barrier layer formed on the metal oxide active layer and the gate insulation layer, and a portion of the etching barrier layer corresponding to the first storage electrode is provided with a storage through hole;
• a source electrode and a drain electrode electrically connected to the metal oxide active layer through the etching barrier layer;
• a second storage electrode located in the storage through hole, wherein the first storage capacitor, the gate insulation layer and the second storage electrode form a storage capacitor;
• a passivation layer covers the etching barrier layer, the source electrode, the drain electrode and the second storage electrode;
• and
• a pixel electrode formed on the passivation layer, and the pixel electrode is electrically connected to the drain electrode.