Position And Temperature Monitoring Of ALD Platen Susceptor

A deposition apparatus comprising:

• a gas distribution assembly having a front surface and an edge;
• a susceptor assembly spaced from the gas distribution assembly to rotate a plurality of substrates around a central axis, the susceptor assembly having a top surface with a plurality of recesses to hold a plurality of substrates, a bottom surface and an edge, wherein the top surface of the susceptor assembly and the front surface of the gas distribution assembly defining a gap;
• a camera having a field of view including the edge of the susceptor assembly;
• and
• a controller connected to the camera to determine the gap between the top surface of the susceptor assembly and the front surface of the gas distribution assembly.

A deposition apparatus comprising:

• a gas distribution assembly having a front surface and an edge;
• a susceptor assembly spaced from the gas distribution assembly to rotate a plurality of substrates around a central axis, the susceptor assembly having a top surface with a plurality of recesses to hold a plurality of substrates, a bottom surface and an edge, wherein the top surface of the susceptor assembly and the front surface of the gas distribution assembly define a gap;
• a plurality of capacitance sensors positioned on the front surface of the gas distribution assembly directed toward the top surface of the susceptor assembly, each of the capacitance sensors providing an electrical signal which is proportional to a distance from the top surface of the susceptor assembly to the capacitance sensor;
• and
• a controller connected to the plurality of capacitance sensors to determine the gap between the top surface of the susceptor assembly and the front surface of the gas distribution assembly from the electrical signals provided by the plurality of capacitance sensors.