Raising-and-lowering mechanism, stage and plasma processing apparatus

A stage that includes a raising-and-lowering mechanism, the stage comprising:

• a pin insertion hole disposed in a stage, on which a processing target that is to be processed in a processing chamber is placed, the pin insertion hole penetrating through the stage in an up-and-down direction;
• a lifter pin that is inserted through the pin insertion hole and is raised and lowered in the up-and-down direction;
• a lubrication unit that is disposed at a predetermined height between the pin insertion hole and the lifter pin, and that supplies a lubricant to the lifter pin;
• a drive unit that drives the lifter pin in the up-and-down direction;
• and
• a heat-transfer gas supplying unit that
• includes a heat-transfer gas supplying path communicating with the pin insertion hole at a position higher than the lubrication unit, and
• supplies a heat-transfer gas to the pin insertion hole.

A plasma processing apparatus comprising:

• a stage, on which a processing target that is to be processed in a processing chamber is placed;
• and a raising-and-lowering mechanism by which the processing target is raised and lowered, wherein the raising-and-lowering mechanism includes
• a pin insertion hole that is disposed in the stage and penetrates through the stage in an up-and-down direction,
• a lifter pin that is inserted through the pin insertion hole and is raised and lowered in the up-and-down direction,
• a lubrication unit that is disposed at a predetermined height between the pin insertion hole and the lifter pin, and that supplies a lubricant to the lifter pin,
• a drive unit that drives the lifter pin in the up-and-down direction, and
• a heat-transfer gas supplying unit that
• includes a heat-transfer gas supplying path communicating with the pin insertion hole at a position higher than the lubrication unit and
• supplies a heat-transfer gas to the pin insertion hole.