Wetting layers for optical device enhancement

A method of fabricating an optical device, comprising:

• transferring a substrate into a process chamber;
• cleaning a surface of the substrate by sputter etching;
• forming a dielectric layer on the surface of the substrate, the dielectric layer comprising an oxide-containing material;
• forming a first wetting layer over the dielectric layer;
• forming a metal layer over the first wetting layer, the metal layer comprising one or more of aluminum, silver, and gold;
• and
• forming a second wetting layer over the metal layer, wherein the second wetting layer is comprised of a different material than the first wetting layer.

An optical device, comprising:

• a substrate;
• a dielectric film disposed on and in contact with the substrate, the dielectric film comprising an oxide-containing material;
• a first wetting layer disposed on and in contact with the dielectric film;
• and
• a metal-containing film disposed on and in contact with the wetting layer, the metal-containing film comprising one or more of aluminum, silver, and gold.