Nanoimprint lithography with a six degrees-of-freedom imprint head module

An imprint lithography system comprising:

• a substrate stage configured to retain a substrate;
• an imprint head module configured to retain a template and to translate the template relative to the substrate, the imprint head module comprising:
• a base;
• a control body coupled to the base and configured to translate and to rotate relative to the base;
• a first set of actuators operatively coupled to the base and to the control body, wherein the first set of actuators is configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis;
• a second set of actuators operatively coupled to the base and to the control body, wherein the second set of actuators is configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis;
• and
• a flexure coupling the base and the control body, wherein a compliance of the flexure corresponds to a displacement of the control body relative to the base in response to at least one of the first force and the second force, and the flexure is configured to restrict translation and rotation of the control body with respect to the base.

An imprint lithography alignment method comprising:

• dispensing an imprint resist on a substrate;
• contacting the imprint resist with a template that is mounted on an imprint head module, wherein the imprint resist is a liquid;
• assessing an alignment error between the template and the substrate, wherein the alignment error comprises a translation error in a direction along at least one of three orthogonal axes and an angular error about at least one of the three orthogonal axes;
• and
• adjusting the alignment error based on a six degrees-of-freedom movement of the imprint head module relative to the substrate corresponding to the translation error and the angular error.