Photomasks including shading layer and methods of forming patterns using the same
AssigneeSK hynix Inc.
InventorSoo Kyeong JEONG
Life of this patent
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Abstract
A photomask and a method of forming patterns using the photomask are provided. The photomask includes a mask body including a pattern region and a peripheral region and having a first surface and a second surface. Mask patterns are disposed on a portion overlapping with the pattern region of the first surface of the mask body. A shading layer is disposed in the peripheral region. The shading layer provides a spill-over-shading region extending to overlap with a critical dimension (CD) correction region in which CD correction in the pattern region is required.
Claims20
A photomask comprising:
- a mask body including a first surface and a second surface, the first surface including a first pattern region and a peripheral region;
- mask patterns disposed on the first pattern region;
- and
- a shading layer disposed in the peripheral region,
- wherein the shading layer provides a spill-over-shading region extending to overlap with a critical dimension (CD) correction region of the first pattern region.
A method of forming patterns using a photomask including a mask body including a pattern region and a peripheral region and having a first surface and a second surface, mask patterns disposed on a portion overlapping with the pattern region of the first surface of the mask body, and a shading layer disposed in the peripheral region, wherein the shading layer provides a spill-over-shading region extending to overlap with a critical dimension (CD) correction region in which CD correction in the pattern region is required, the method comprising:
- changing a position of the shading layer to control a width of an overlap region of the spill-over-shading region and the pattern region;
- and
- transferring pattern images onto a resist layer using the photomask.
A method of forming fine patterns, the method comprising:
- providing a photomask, wherein the photomask comprises a mask body including a first surface and a second surface, the first surface including a first pattern region and a peripheral region;
- mask patterns disposed on the first pattern region;
- and a shading layer disposed in the peripheral region, and wherein the shading layer provides a spill-over-shading region extending to overlap with a critical dimension (CD) correction region of the first pattern region,
- changing a position of the shading layer to control a width of an overlap region of the spill-over-shading region and the first pattern region;
- and
- transferring pattern images onto a resist layer using the photomask.
Dependencies are inferred from the claim text.