Block copolymer and surface treatment agent using same
AssigneeTosoh Corporation
InventorsYukie MAEJIMA, Satoru KONDOU, Shinya IMATOMI, Satoru YAMADA, Hiroyuki ITO
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AssigneeTosoh Corporation
InventorsYukie MAEJIMA, Satoru KONDOU, Shinya IMATOMI, Satoru YAMADA, Hiroyuki ITO
Estimating the term…
The present invention addresses the problem of providing a block copolymer which is useful as a surface treatment agent for cell culture substrates, said surface treatment agent enabling cell separation in a short period of time. The above-mentioned problem is solved by a block copolymer that includes the following blocks (A), (B) and (C):(A) a temperature-responsive polymer block that has a lower critical solution temperature (LCST) within the range of from 0° C. to 50° C. with respect to water (B) a hydrophilic polymer block that does not have an LCST within the range of from 0° C. to 50° C., while having an HLB value within the range of from 9 (inclusive) to 20 (exclusive) (C) a hydrophobic polymer block that does not have an LCST within the range of from 0° C. to 50° C., while having an HLB value within the range of from 0 (inclusive) to 9 (exclusive).
A block copolymer comprising the following blocks (A), (B), and (C):
Dependencies are inferred from the claim text.