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US 2019/0172845 A1Published application
Array Structure, Manufacturing Method Thereof, Array Substrate and Display Device
AssigneesBoe Technology Group Co., Ltd., Beijing Boe Optoelectronics Technology Co., Ltd.
InventorsDawei Shi, Xinyou Ji, Fuqiang Li, Jian Guo
Life of this patent
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Abstract
An array structure and a manufacturing method thereof are disclosed. The method for manufacturing the array structure includes: forming a gate insulating layer on a substrate; and etching the gate insulating layer at a position corresponding to a source/drain signal access terminal to form a through-hole structure provided with an outward-inclined side wall in the gate insulating layer.
Claims14
A method for manufacturing an array structure, comprising:
- forming a gate insulating layer on a substrate;
- and
- etching the gate insulating layer at a position corresponding to a source/drain signal access terminal to form a through-hole structure provided with an outward-inclined side wall in the gate insulating layer.
An array structure, comprising:
- a substrate;
- and
- a gate insulating layer provided on the substrate and provided with a through-hole structure which comprises an outward-inclined side wall.
An array structure, comprising:
- a gate insulating layer provided on a substrate;
- and
- a source/drain layer provided on the gate insulating layer and provided with a through-hole structure which comprises an outward-inclined side wall.
Dependencies are inferred from the claim text.