Exhaust device, processing apparatus, and exhausting method
AssigneeTokyo Electron Limited
InventorsKazuya NAGASEKI, Kazuki MOYAMA, Toshiya MATSUDA, Naokazu FURUYA, Tatsuro OHSHITA
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsKazuya NAGASEKI, Kazuki MOYAMA, Toshiya MATSUDA, Naokazu FURUYA, Tatsuro OHSHITA
Estimating the term…
An exhaust device including an exhaust mechanism and an exhaust unit is provided. The exhaust mechanism includes a first blade unit and a second blade unit provided in an exhaust space of a processing vessel including a processing space of a vacuum atmosphere for applying a process to a workpiece. The first blade unit and the second blade unit are arranged coaxially with a periphery of the workpiece, and at least one of the first blade unit and the second blade unit is rotatable. The exhaust unit is provided at a downstream side of the exhaust mechanism and communicates with the exhaust space. The exhaust unit is configured to exhaust gas in the processing vessel.
An exhaust device comprising:
A processing apparatus comprising:
A method of exhausting gas in a processing vessel including a processing space of a vacuum atmosphere for applying a process to a workpiece, and an exhaust space;
Dependencies are inferred from the claim text.