Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate

A method of obtaining an arrangement angle of a blanking aperture array plate, the method comprising:

• passing a charged-particle beam through a plurality of openings provided in a shaping aperture array plate and forming multiple charged-particle beams including beams of m rows and n columns (m and n are integers equal to or greater than two);
• performing blanking deflection by using a blanking aperture array plate including a blanker corresponding to each beam of the multiple charged-particle beams, the blanking deflection being performed in such a manner that a plurality of beams in the i-th row (i is an integer satisfying 1≤i≤m) irradiate a substrate mounted on a moving stage, a resist being applied on the substrate;
• deflecting the plurality of beams and writing a line pattern on the substrate, the deflection being performed in a direction orthogonal to a move direction of the stage in such a manner that a writing area for a beam in the j-th column (j is an integer satisfying 1≤j≤n−1) is not continuously adjacent to a writing area for a beam in the (j+1)th column;
• measuring a degree of unevenness of an edge of the line pattern;
• and
• obtaining an arrangement angle of the shaping aperture array plate and the blanking aperture array plate based on the degree of unevenness.