Mark detection apparatus, mark detection method, measurement apparatus, exposure apparatus, exposure method and device manufacturing method
AssigneeNikon Corporation
InventorsShigeki EGAMI, Yoshifumi NAKAKOJI
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AssigneeNikon Corporation
InventorsShigeki EGAMI, Yoshifumi NAKAKOJI
Estimating the term…
A mark detection apparatus is configured to detect a mark formed in a mark area of an object and has: a first optical system configured to emit a first measurement light to the mark area; a second optical system configured to irradiate the mark area with at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the first optical system; and a light receiver that configured to optically receive at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the second optical system.
A mark detection apparatus that is configured to detect a mark formed in a mark area of an object,
A mark detection apparatus that is configured to detect a mark formed in a mark area of an object,
A mark detection apparatus that is configured to detect a mark formed in a mark area of an object,
A mark detection apparatus that is configured to detect a mark formed in a mark area of an object,
A mark detection method of detecting a mark formed in a mark area of an object,
A mark detection method of detecting a mark formed in a mark area of an object,
Dependencies are inferred from the claim text.