A Membrane Assembly and Particle Trap
AssigneesASML Holding N.V., ASML Netherlands B.V.
InventorsRonald Peter ALBRIGHT, Lowell Lane BAKER, Daniel Nathan BURBANK
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Abstract
Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.
Claims21
-20. (canceled)
A patterning device, comprising:
- a first structure of the patterning device having a first surface;
- a second structure of the patterning device having a second surface, wherein the first and second surfaces oppose each other;
- and
- a trap formed on the first surface and opposing the second surface, the trap comprising a plurality of baffles,
- wherein a gap is formed between the opposing first and second surfaces.
An apparatus, comprising:
- a first structure of a patterning device having a first surface;
- a second structure of the patterning device having a second surface, wherein a gap is formed between the first and second surfaces;
- and
- a first trap attached to the first surface, the first trap comprising a plurality of baffles protruding from the first surface.
An apparatus, comprising:
- a trap configured to restrain contaminant particles, wherein the trap is formed on a surface of the apparatus and comprises a plurality of baffles protruding from the surface.
Dependencies are inferred from the claim text.