Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin

A compound represented by Formula (1M),

• in Formula (1M), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(═O)CH12—, R11 and R12 each independently represent a monovalent substituent, X represents an oxygen atom or a sulfur atom, L represents a (n+1)-valent linking group, R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer, and in a case where n is 2 or more, a plurality of R's may be identical to or different from each other.

A resin having:

• a repeating unit represented by Formula (1),
• in Formula (1), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(═O)CH2—, R11 and R12 each independently represent a monovalent substituent, X represents an oxygen atom or a sulfur atom, L represents a (n+1)-valent linking group, R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer, and in a case where n is 2 or more, a plurality of R's may be identical to or different from each other.