Imaging panel and method for producing same

A method for producing an imaging panel that generates an image based on scintillation light that is obtained from X-rays transmitted through an object, the producing method comprising:

• forming a thin film transistor on a substrate;
• forming a first insulating film and a second insulating film on the thin film transistor;
• forming a first contact hole on a drain electrode of the thin film transistor so that the first contact hole passes through the first insulating film and the second insulating film;
• forming, on the second insulating film, a first transparent electrode film as a lower electrode that is connected with the drain electrode through the first contact hole;
• forming a first semiconductor layer of a first conductive type, an intrinsic amorphous semiconductor layer, and a second semiconductor layer of a second conductive type that is opposite to the first conductive type, in the stated order, as a photoelectric conversion layer on the first transparent electrode film;
• forming an upper electrode on the second semiconductor layer;
• forming an insulating film as an upper electrode protection film, on the upper electrode;
• applying a resist on the insulating film, and etching the insulating film, the first semiconductor layer, the intrinsic amorphous semiconductor layer, and the second semiconductor layer, so as to form the photoelectric conversion layer and the upper electrode protection film;
• removing the resist, and thereafter, carrying out a reduction treatment with respect to a surface of the photoelectric conversion layer;
• forming a third insulating film that covers the upper electrode protection film, after the reduction treatment;
• forming a second contact hole on the upper electrode so that the second contact hole passes through the third insulating film and the upper electrode protection film;
• forming a fourth insulating film on the third insulating film except for a portion of the second contact hole;
• forming a signal line for supplying a bias voltage, on the fourth insulating film;
• forming, on the fourth insulating film, a transparent conductive film that connects the signal line and the upper electrode with each other through the second contact hole;
• and
• forming a fifth insulating film that covers the transparent conductive film.