Defect inspection device, defect inspection method, and program
AssigneeFUJIFILM Corporation
InventorYasuhiko KANEKO
Life of this patent
Estimating the term…
Loading patent…
AssigneeFUJIFILM Corporation
InventorYasuhiko KANEKO
Estimating the term…
An object of the present invention is to provide a defect inspection device, a defect inspection method, and a program capable of accurately and rapidly detecting a minute defect and a defect candidate image indicated by a minute signal in a received light image of an inspection object. A defect inspection device (10) includes an image acquisition unit (I/F 16), an input unit (I/F 16), an exposure condition acquisition unit (I/F 16), a storage unit (24), and a parameter determination unit (processing unit 22) that determines an image processing parameter for a received light image on the basis of an exposure condition acquired by the exposure condition acquisition unit, a physical feature received by the input unit, and exposure information stored in the storage unit, and an image processing unit (processing unit 22) that extracts a defect candidate image which is an image corresponding to a defect candidate of the inspection object from the received light image by performing image processing of the received light image on the basis of the image processing parameter determined by the parameter determination unit (processing unit 22).
A defect inspection device comprising:
A defect inspection device comprising:
A defect inspection method comprising:
A defect inspection method comprising:
Dependencies are inferred from the claim text.