Mass flow controller, apparatus for manufacturing semiconductor device, and method for maintenance thereof

An apparatus for manufacturing a semiconductor device, the apparatus comprising:

• a chamber;
• first and second mass flow controllers that are each configured to provide a gas into the chamber;
• and
• a controller communicatively connected to the first and second mass flow controllers,
• wherein the controller is configured to determine an absolute volume of the gas provided into the chamber at a standard flow rate of the first mass flow controller, to determine a detected flow rate of the gas provided at a measured flow rate of the second mass flow controller, and to compare the detected flow rate with the standard flow rate to verify a full-scale error in the measured flow rate.

A method for maintenance of an apparatus for manufacturing a semiconductor device, the method comprising:

• using a standard flow rate of a mass flow controller to obtain an absolute volume of a gas in a chamber;
• and
• periodically verifying a full-scale error in a measured flow rate of the mass flow controller using the absolute volume,
• wherein periodically verifying the full-scale error in the measured flow rate comprises:
• providing the chamber with the gas at the measured flow rate;
• determining a detected flow rate of the mass flow controller based on the absolute volume;
• and
• comparing the detected flow rate with the standard flow rate to obtain the full-scale error in the measured flow rate.