Sapphire thin film coated substrate

A sapphire-coated substrate made by a method comprising:

• an e-beam evaporation or sputtering deposition process at room temperature or 25° C., wherein sapphire is deposited directly on to a substrate selected from quartz, fused silica, silicon, glass, or toughened glass to form the sapphire-coated substrate, wherein the substrate during deposition is without external cooling or heating;
• and
• an annealing process, wherein said sapphire-coated substrate is annealed under an annealing temperature ranging between approximately room temperature or 25° C. and 2040° C. for an effective duration of time.