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US 2019/0168265 A1Published application
Compositions and methods for reducing interaction between abrasive particles and a cleaning brush
AssigneeEntegris, Inc.
InventorDaniela WHITE
Life of this patent
Estimating the term…
Abstract
Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.
Claims20
A method of removing abrasive particles from a post-chemical-mechanical-processing (post-CMP) cleaning brush, the method comprising:
- providing a post-CMP cleaning brush having a polymeric surface and having abrasive particle residue at the polymeric surface,
- providing a cleaning solution having a pH below 7, the cleaning solution comprising:
- cleaning agent and
- particle removal agent, and
- removing abrasive particle residue from the polymeric surface by contacting the polymeric surface with the cleaning solution.
2 more elements
A method of post-chemical-mechanical-processing (post-CMP) cleaning of a substrate, the method comprising:
- providing a post-CMP cleaning brush having a polymeric surface,
- providing a cleaning solution that comprises:
- cleaning agent and
- particle removal agent,
- providing a substrate that includes a surface, with residue at the substrate surface, the residue including abrasive particles, and
- removing residue from the substrate surface by exposing the substrate surface and the polymeric surface to the cleaning solution while contacting the substrate surface with the polymeric surface and while moving the substrate surface relative to the polymeric surface.
3 more elements
A cleaning solution concentrate useful for cleaning a substrate in a post-chemical-mechanical processing step, the cleaning solution comprising:
- cleaning agent, and
- at least 0.1 weight percent particle removal agent that includes a hydrogen bonding group.
Dependencies are inferred from the claim text.