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US 2019/0167538 A1Published application
Nail gel polish and its manufacturing method
AssigneeShanghai O'Nine Technologies Ltd. , Shanghai
InventorsLaipeng CHEN, Mingtai GE, Yueyun DONG
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Abstract
A UV/LED radiation-curable nail gel polish composition, method and the use thereof. The composition is comprised of oligomers and monomers and specially obtaining alcohol soluble thermoplastic resins. The advantage of this method is making the removing of the polymerized nail gel polish by medical alcohol easier and safer.
Claims10
A nail gel polish, comprising the following components:
- aliphatic urethane (methyl)acrylate oligomer 15%-50% by weight;
- alcohol soluble thermoplastic resin 10%-20% by weight, wherein the alcohol soluble thermoplastic resin comprises the molecular structure as follow:
- (methyl)acrylate monomer 15%-30% by weight;
- photoinitiator 1%-10% by weight;
- pigment 1%-5% by weight;
- dispersant 0.1%-2% by weight;
- thickening agent 1% 0-5% by weight;
- levelling agent 0.1%-4% by weight;
- and
- defoamer 0.1%-0.5% by weight.
7 more elements
Dependencies are inferred from the claim text.