Intimate skin conditioner veil comprising skin well-being agent

An intimate skin conditioner veil configured to be positioned in an undergarment so that the veil covers a mons pubis in front of an anterior labia commissure of a female user, without covering any part of a vulval vestibule area of the user, wherein

• the veil is substantially non-absorbent, the veil being configured to absorb 0.9% by weight sodium chloride solution in an amount of 0-2 times a weight of the veil,
• the veil has a longitudinal central line extending in the longitudinal direction of
• the veil, and a first extension in the longitudinal direction, between a front end and a rear end of the veil, and a second extension in a transverse direction perpendicular to the longitudinal central line,
• the veil comprises a front edge and first and second side edges, the front edge intersects the first side edge at a first front transition point and intersects the second side edge at a second front transition point, the veil further comprises a main portion having a length (L1) in the longitudinal direction of the veil, the veil has a total longitudinal length (L2), the length (L1) of the main portion being at least 50% of the total longitudinal length (L2) of the veil, wherein the main portion is bounded by a straight front transversal line between the first and second front transition points and by the first and second side edges, and tapers towards the rear end of the veil,
• the veil has a garment facing side and a skin contacting side, the garment facing side and the skin contacting side face away from one another, and the veil comprises a garment facing layer arranged on the garment facing side of the veil, and a space creating layer arranged on the skin contacting side of the veil,
• the veil further comprises an additive composition in the form of either:
• a skin well-being agent;
• or the skin well-being agent and a carrier substance carrying the skin well-being agent, and
• the additive composition comprising the skin well-being agent is comprised in a loft layer or a loft portion of the space creating layer.