US 2019/0163055 A1Published application

Salts and photoresists comprising same

AssigneeRohm and Haas Electronic Materials LLC

InventorsEmad Aqad, James F. Cameron, James W. Thackeray

Life of this patent

Estimating the term…

Abstract

New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

Claims11

Dependent claims

A salt comprising an anion component that comprises one or more Te atoms.

Dependencies are inferred from the claim text.

Facts

Application: 16/205,055Filed 29 Nov 2018
Priority: 30 Nov 2017
Published: 30 May 2019
Term ends: Not estimatedThe source records don’t support an estimate.

Classification9 codes

G03F 7/0042
Photosensitive materials: with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
C07F 11/00
Compounds containing elements of groups 6 or 16 of the periodic table
G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
G03F 7/027
Photosensitive materials: non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Family

Application62/593,229Us provisional application · filed 30 Nov 2017
US 11,448,960 B2Related patent
US 2019/0163055 A1This patent

From the US filing history. Foreign family members aren’t listed.

Timeline

Citations

Open elsewhere

Building an agent or pulling many patents? Use the API or MCP server instead of scraping pages. Get an API key

patentgrep

Loading patent…

patentgrepSearch patents

Back to results