Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning

A device for controlling an exposure area in an extreme ultraviolet lithography tool, comprising:

• an extreme ultraviolet radiation source;
• a moveable stage for supporting a photoresist coated substrate;
• one or more reticle masking blades located between the extreme ultraviolet radiation source and a reflective reticle support stage;
• one or more actuators coupled with the one or more reticle masking blades configured to move the reticle masking blades;
• and
• a position sensor configured to determine positions of the one or more reticle masking blades.

An extreme ultraviolet lithography tool, comprising:

• an extreme ultraviolet radiation source;
• a moveable stage for supporting a photoresist coated substrate;
• one or more reticle masking blades located between the extreme ultraviolet radiation source and a reflective reticle support stage;
• a position sensor configured to monitor a position of the one or more reticle masking blades during a selective photoresist exposing operation;
• one or more actuators configured to adjust the position of the one or more reticle masking blades if the one or more reticle masking blades are outside a set tolerance range;
• and
• a controller configured to determine whether the one or more reticle masking blades are located within the set tolerance range, and configured to control the actuators.