Back to results
US 2019/0161507 A1Published application
Titanium-containing film forming compositions for vapor deposition of titanium-containing films
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsAntonio SANCHEZ, Jean-Marc GIRARD, Grigory NIKIFOROV, Nicolas BLASCO
Life of this patent
Estimating the term…
Abstract
Titanium-containing film forming compositions comprising titanium halide-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.
Claims20
A titanium-containing film forming composition comprising a titanium halide-containing precursor having the following formula:
- TiXb:Ac
- with b=3 or 4;
- c=1-3;
- X=Br or I;
- A=SRR′, SeRR′, or TeRR′, and R and R′ are independently H or a C1-C5 hydrocarbon.
2 more elements
Dependencies are inferred from the claim text.