Method for oled device fabrication using patterned film mask

Abstract

A patterned film mask for applying a film layer to a substrate is disclosed. The patterned film mask includes a base layer and a plurality of through holes. The plurality of through holes permeates through the base layer and defines a predetermined pattern for the film layer. The film layer and the base layer have at least one different surface wettability characteristic and the substrate and the film layer have at least one of the same wettability characteristics. Specifically, the substrate and the film layer may be hydrophilic while the base layer may be hydrophobic. Alternatively, the substrate and the film layer may be hydrophobic while the base layer may be hydrophilic.

Dependencies are inferred from the claim text.