Light source for lithography exposure process
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsin-Feng Chen, Han-Lung Chang, Li-Jui Chen, Bo-Tsun Liu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsin-Feng Chen, Han-Lung Chang, Li-Jui Chen, Bo-Tsun Liu
Estimating the term…
A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.
A lithography exposure system, comprising:
A lithography exposure system, comprising:
A method for generating a radiation light in a lithography exposure system, comprising:
The method as claimed in claimed 13, further comprising stopping the supply of the droplet of the target fuel via the first nozzle assembly by terminating the flow of the target fuel out of the storage member with a valve mechanism.
The method as claimed in claimed 13, further comprising guiding the flow of the target fuel in the first nozzle assembly in a second extending axis that is not parallel with a first extending axis along which the storage member extends.
The method as claimed in claimed 13, further comprising:
The method as claimed in claimed 16, wherein the image of the droplet is generated when the droplet is in the excitation zone.
The method as claimed in claimed 13, further comprising:
The method as claimed in claimed 13, further comprising:
The method as claimed in claimed 13, further comprising replacing the first nozzle assembly with another new nozzle assembly after the first nozzle assembly is disengaged from the storage member.
Dependencies are inferred from the claim text.