Imprint apparatus and method of manufacturing an article
AssigneeCanon Kabushiki Kaisha
InventorKiyohito Yamamoto
Life of this patent
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Abstract
An imprint apparatus includes a processing unit that forms a pattern of an imprint material on a substrate by using a mold, a chamber that accommodates this processing unit and includes a first gate to which a first containment unit that contains the substrate before being processed by the processing unit is connected and a second gate to which a second containment unit that contains the substrate after being processed by the processing unit is connected, and a control unit that prohibits opening of the first gate until a predetermined time elapses since the substrate on which the pattern is formed by the processing unit is contained in the second containment unit and the second gate is closed.
Claims7
An imprint apparatus characterized by comprising:
- a processing unit that forms a pattern of an imprint material on a substrate by using a mold;
- a chamber that accommodates the processing unit and includes a first gate to which a first containment unit that contains the substrate before being processed by the processing unit is connected and a second gate to which a second containment unit that contains the substrate after being processed by the processing unit is connected;
- and
- a control unit that prohibits opening of the first gate until a predetermined time elapses since the substrate on which the pattern is formed by the processing unit is contained in the second containment unit and the second gate is closed.
A method of manufacturing an article, the method comprising:
- a step of forming the pattern on the substrate by using an imprint apparatus;
- and
- a step of processing the substrate on which the pattern is formed in the above-described step
- wherein the imprint apparatus comprising:
- a processing unit that forms a pattern of an imprint material on a substrate by using a mold;
- a chamber that accommodates the processing unit and includes a first gate to which a first containment unit that contains the substrate before being processed by the processing unit is connected and a second gate to which a second containment unit that contains the substrate after being processed by the processing unit is connected;
- and
- a control unit that prohibits opening of the first gate until a predetermined time elapses since the substrate on which the pattern is formed by the processing unit is contained in the second containment unit and the second gate is closed.
Dependencies are inferred from the claim text.