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US 2019/0155143 A1Published application
Method And System For Cross-Tile OPC Consistency
AssigneeMentor Graphics Corporation
InventorGeorge P. Lippincott
Life of this patent
Estimating the term…
Abstract
Aspects of the disclosed technology relate to techniques for achieving optical proximity correction cross-tile consistency. A layout design is divided into a plurality of regions. Optical proximity correction iterations are performed on each of the plurality of regions to generate a modified layout design. Based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design, a final modified layout design is generated such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design.
Claims18
A method, executed by at least one processor of a computer, comprising:
- receiving a layout design, the layout design being divided into a plurality of regions;
- performing a plurality of optical proximity correction iterations on each of the plurality of regions to generate a modified layout design, each of the plurality of optical proximity correction iterations comprising:
- performing simulation to determine edge placement errors for the edge fragments in the each of the plurality of regions,
- determining intermediate edge adjustment values for the edge fragments in the each of the plurality of regions based on the edge placement errors and a layout pattern in a predetermined-size area surrounding each of the edge fragments such that edge fragments in each of the plurality of regions having the same layout pattern have the same intermediate edge adjustment value, and
- generating, based on the intermediate edge adjustment values, a modified layout region for the each of the plurality of regions for a next optical proximity correction iteration;
- generating a final modified layout design, which is to be used for photomask manufacture, based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design;
- and
- storing information of the final modified layout design.
5 more elements
One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
- receiving a layout design, the layout design being divided into a plurality of regions;
- performing a plurality of optical proximity correction iterations on each of the plurality of regions to generate a modified layout design, each of the plurality of optical proximity correction iterations comprising:
- performing simulation to determine edge placement errors for the edge fragments in the each of the plurality of regions,
- determining intermediate edge adjustment values for the edge fragments in the each of the plurality of regions based on the edge placement errors and a layout pattern in a predetermined-size area surrounding each of the edge fragments such that edge fragments in each of the plurality of regions having the same layout pattern have the same intermediate edge adjustment value, and
- generating, based on the intermediate edge adjustment values, a modified layout region for the each of the plurality of regions for a next optical proximity correction iteration;
- generating a final modified layout design, which is to be used for photomask manufacture, based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design;
- and
- storing information of the final modified layout design.
5 more elements
A system, comprising:
- one or more processors, the one or more processors programmed to perform a method, the method comprising:
- receiving a layout design, the layout design being divided into a plurality of regions;
- performing a plurality of optical proximity correction iterations on each of the plurality of regions to generate a modified layout design, each of the plurality of optical proximity correction iterations comprising:
- performing simulation to determine edge placement errors for the edge fragments in the each of the plurality of regions,
- determining intermediate edge adjustment values for the edge fragments in the each of the plurality of regions based on the edge placement errors and a layout pattern in a predetermined-size area surrounding each of the edge fragments such that edge fragments in each of the plurality of regions having the same layout pattern have the same intermediate edge adjustment value, and
- generating, based on the intermediate edge adjustment values, a modified layout region for the each of the plurality of regions for a next optical proximity correction iteration;
- generating a final modified layout design, which is to be used for photomask manufacture, based on the modified layout design and the layout pattern surrounding each of the edge fragments in the modified layout design such that the edge fragments in different regions in the plurality of regions in the final modified layout design having the same layout pattern have a same edge adjustment value with respect to the layout design;
- and
- storing information of the final modified layout design.
6 more elements
Dependencies are inferred from the claim text.