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US 2019/0154891 A1Published application
Dry etching composition, kit, pattern formation method, and method of manufacturing optical filter
AssigneeFUJIFILM Corporation
InventorKeisuke ARIMURA
Life of this patent
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Abstract
A dry etching composition includes a coloring material which allows transmission of infrared rays and shields visible light, a curable compound, and a solvent, in which a ratio A/B between a minimum value A of a light absorbance of the composition in a wavelength range of 400 to 700 nm and a maximum value B of a light absorbance in a wavelength range of 1100 to 1300 nm is 4.5 or greater.
Claims16
A dry etching composition comprising:
- a coloring material which allows transmission of infrared rays and shields visible light;
- a curable compound;
- and
- a solvent,
- wherein a ratio A/B between a minimum value A of a light absorbance of the composition in a wavelength range of 400 to 700 nm and a maximum value B of a light absorbance in a wavelength range of 1100 to 1300 nm is 4.5 or greater.
2 more elements
Dependencies are inferred from the claim text.