Vapor deposition process for the manufacture of coated particles

An apparatus for coating particles by atomic layer deposition comprising:

• a. a first reactor capable of bringing the particles in contact with a first reactive gas having a first reactor particle inlet and a first reactor particle outlet;
• b. a second reactor capable of bringing the particles in contact with a second reactive gas having a second reactor particle inlet and a second reactor particle outlet;
• c. a first separation device capable of separating the particles from a first reactive gas, having a first separation device particle-gas inlet, a first separation device gas outlet, and a first separation device particle outlet;
• d. a second separation device capable of separating the particles from a second reactive gas, having a second separation device particle-gas inlet, a second separation device gas outlet, and a second separation device particle outlet;
• e. a first constricted flow path comprising a first valve assembly connected to the first reactor particle inlet, capable of controlling the conveying of the particles into the first reactor;
• f. a second constricted flow path comprising a second valve assembly capable of controlling the conveying of the particles from the first reactor particle outlet through the second valve assembly to the second reactor, or to a first separation device;
• g. a third constricted flow path comprising a third valve assembly capable of controlling the conveying of the particles from the second reactor particle outlet through the third valve, or to a first separation device.

An apparatus for coating particles having a first particle batch and a second particle batch by atomic layer deposition comprising:

• a. a first reactor capable of bringing the first particle batch in contact with a first reactive gas having a first reactor particle inlet and a first reactor particle outlet;
• b. a second reactor capable of bringing the second particle batch in contact with a second reactive gas having a second reactor particle inlet and a second reactor particle outlet;
• c. a first separation device capable of separating the first particle batch from a first reactive gas, having a first separation device particle-gas inlet, a first separation device gas outlet, and a first separation device particle outlet;
• d. a second separation device capable of separating the second particle batch from a second reactive gas, having a second separation device particle-gas inlet, a second separation device gas outlet, and a second separation device particle outlet;
• e. a first constricted flow path comprising a first valve assembly connected to the first reactor particle inlet, capable of controlling the conveying of the first particle batch into the first reactor;
• f. a second constricted flow path comprising a second valve assembly capable of controlling the conveying of the first particle batch from the first reactor particle outlet through the second valve assembly to the second reactor, or to a first separation device;
• g. a third constricted flow path comprising a third valve assembly capable of controlling the conveying of the second particle batch from the second reactor particle outlet through the third valve, or to the second separation device.
• wherein the apparatus is capable of saturating the entire surface of the first particle batch with a first reactive gas and saturating the entire surface of the second particle batch with a second reactive gas simultaneously and via computer control.