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US 2019/0153582 A1Published application
Sputtering apparatus and method for manufacturing film
AssigneeCanon Kabushiki Kaisha
InventorSoya Todo
Life of this patent
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Abstract
An apparatus includes a chamber, a reactive gas supply unit, an inert gas supply unit, a power source, a light reception unit, and a control unit configured to control at least one of a flow rate of the reactive gas and a flow rate of inert gas in such a manner that an intensity of the light approaches a target light intensity with use of a predetermined function in which an output of the power source in a compound mode and an output of the power source in a transition mode, and a film formation speed are associated with each other.
Claims14
An apparatus comprising:
- a chamber configured such that a film formation object and a target are disposed therein;
- a reactive gas supply unit configured to supply reactive gas into the chamber;
- an inert gas supply unit configured to supply inert gas into the chamber;
- a power source configured to supply power to the target to generate plasma inside the chamber to cause an ion of the inert gas in the plasma to collide with the target;
- a light reception unit configured to receive light emitted from the plasma;
- and
- a control unit configured to control at least one of a flow rate of the reactive gas and a flow rate of the inert gas such that an intensity of the light approaches a target light intensity with use of a predetermined function in which an output of the power source in a compound mode and an output of the power source in a transition mode, and a film formation speed are associated with each other.
4 more elements
A method comprising:
- disposing a film formation object and a target by using a chamber;
- supplying reactive gas and inert gas into the chamber;
- supplying power, from a power source, to a target to generate plasma inside the chamber to cause an ion of the inert gas in the plasma to collide with the target;
- receiving light emitted from the plasma;
- and
- controlling at least one of a flow rate of the reactive gas and a flow rate of the inert gas such that an intensity of the light approaches a target light intensity,
- wherein the target light intensity is set with use of a predetermined function in which an output of the power source in a compound mode and an output of the power source in a transition mode, and a film formation speed are associated with each other.
4 more elements
Dependencies are inferred from the claim text.