Local interconnect structure

A method comprising:

• coupling a reference metal line to a first source/drain terminal of a transistor having a gate terminal, the first source/drain terminal, and a second source/drain terminal;
• routing a local interconnect structure at a same interconnect level as the reference metal line to couple to the gate terminal;
• routing a first interconnect structure above the local interconnect structure to couple to the first source/drain terminal;
• and
• routing a second interconnect structure at a same interconnect level as the first interconnect structure and above the local interconnect structure.

An apparatus comprising:

• a first fin field effect transistor (finFET) with a first gate terminal, a first source/drain terminal connected to a first reference metal line through a first via, and a second source/drain terminal;
• a second finFET with a second gate terminal, a third source/drain terminal connected to a second reference metal line through a second via, and a fourth source/drain terminal;
• a local interconnect structure connected to the first and second gate terminals through one or more third vias and routed at a same interconnect level as the first and second reference lines;
• a first interconnect structure connected to the first source/drain terminal through the first via and the first reference metal line and routed above the local interconnect structure;
• a second interconnect structure connected to the third source/drain terminal through the second via and the second reference metal line and routed above the local interconnect structure;
• and
• a third interconnect structure routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.