Heat Shield for Chamber Door and Devices Manufactured Using Same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMeng-Je Chuang, Wan-Chun Kuan, Yi-Wei Chiu, Tzu-Chan Weng
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMeng-Je Chuang, Wan-Chun Kuan, Yi-Wei Chiu, Tzu-Chan Weng
Estimating the term…
A chamber door, such as an etch chamber door may be heated during etch processing to, e.g., prevent etching by-products from adhering to the etch chamber door. Such heating of the etch chamber door, however, can impact the processing parameters and result in non-uniform processing, such as non-uniform etching characteristics across a semiconductor wafer, for instance. An insulator, such as an insulating film covering surfaces of the heated door, can reduce or eliminate transmission of heat from the door to a work piece such as a semiconductor wafer and this reduce or eliminate the non-uniformity of the process results.
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