Method and apparatus for dynamic lithographic exposure

A photolithography tool, comprising:

• an illumination source configured to generate electromagnetic radiation;
• one or more optical elements configured to provide the electromagnetic radiation to a plurality of image planes according to a pattern on a photomask, wherein the plurality of image planes are vertically separated by a photosensitive material over a substrate;
• and
• wherein the plurality of image planes comprise a first image plane having a first depth of focus that vertically extends through a part of the photosensitive material and a second image plane having a second depth of focus that is below the first depth of focus and that vertically extends to a center of the first depth of focus.

A photolithography tool, comprising:

• an illumination source configured to generate electromagnetic radiation;
• one or more optical elements configured to focus the electromagnetic radiation onto a photosensitive material overlying a substrate according to a pattern on a photomask to form a contiguous exposed region within the photosensitive material;
• and
• a dynamic focal element configured to dynamically change vertical distances at which the electromagnetic radiation is focused above the substrate during a continuous exposure of the contiguous exposed region, wherein the vertical distances are measured along a line that is normal to an upper surface of the substrate.